NanoVision

III-V wafer inspection (GaN, GaS, GaaS, …) and SiC, Sapphire for high-brightness LED applications. High power transistors. RF transistors.

AltaSight Compound combines Altatech's inspection technologies in order to characterize the whole substrate surface, at 80 wafers per hour.

For transparent substrates, AltaSight can be operated in transmission mode, embedded defects are detected even if the classical surface detection does not detect any specific signature of defect at the surface level.

AltaSight Compound can also be configured according to specific applications.

Defects detected

  • Stains
  • Epi pits
  • Dislocation
  • Topography
  • Uniformity of layers
  • Scratches, particles

Macro inspection

  • Large defects 20 to 60µm range
  • Frontside, in transmittance
  • Fully automated
  • ADC

Advanced macro inspection

  • Resolution in 1µm range
  • Frontside
  • Fully automated
  • ADC

Specifications

  • Throughput guaranteed at 80 wafers/hour
  • Automatic defect classification
  • KLARF result file
  • Semi standard compliant

AltaSight key elements

  • Zero edge exclusion
  • High reliability by design
  • Vertical wafer holder for low stress and particle reduction
  • Defects images recorded on the fly for offline review