NanoVision

For silicon, SOI, EPI, quartz and transparent substrates.

AltaSight 300 combines Altatech's inspection technologies in order to characterize the whole substrate surface, at 100 wafers per hour.

AltaSight 300 can also be configured according to specific applications.

Macro inspection

  • Large defects 20 to 60µm range
  • Frontside, backside, edge
  • Fully automated
  • ADC

Advanced macro inspection

  • Resolution in 1 to 5µm range
  • Frontside, backside, edge
  • Fully automated
  • ADC

Specifications

  • Throughput guaranteed at 100 wafers/hour
  • Automatic defect classification
  • KLARF result file
  • Semi standard compliant

AltaSight key elements

  • Zero edge exclusion (wafer handling by edge)
  • High reliability by design
  • Vertical wafer holder for low stress and particle reduction
  • Defects images recorded on the fly for offline review
  • Upgradable to 450mm