Press releases

Altatech Advanced CVD ALD tools complete installation

Montbonnot – France, 3 September 2008.

Altatech Semiconductor, an innovative global provider of advanced Inspection, CVD and Inkjet equipment to the semiconductor industry, is pleased to announce the completion of the installation of their Advanced ALTA CVD™ tools in record time. The systems were installed in an R+D facility and represent a milestone in the acceptance of Altatech’s innovative patented ALD techniques.

Front end: Advanced HighK dielectric gate oxide integration, and tri-silicon via barrier and seed layer Back end: Seedless barrier deposition.

Herve Monchoix, Altatech's Technology Director commented: “We are pleased with the completion of the installation of these systems for both front and back end applications, which verifies the flexibility and performance of our design and technologies.”

Come and see the ALTA CVD™ at Semicon Europa 2008, 7-9 October in Stuttgart. Booth 1366. We will be delighted to show you the unique capabilities of our advanced technology product.